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High Resolution, Large Field of View, Long Working Distance Microscope at a Fraction of Existing Cost

The U.S. Air Force seeks to commercialize through patent licensing a microscopy/lithography technology that corrects for a variety of aberrations in lenses and mirrors. This allows for the use of inexpensive, imperfect optics as the objective lens to image objects with sub-micron resolution. This invention has been reduced for 2D but is equally applicable for 3D imaging.


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