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Peroxygen-based Chemical & Biological Decontamination Formulation
The US Navy seeks partners to license and further develop a next generation, solvent-free decontamination product that is water-activated and effective against chemical and biological agents.
The US Navy has patented a decontamination (decon) product demonstrated to be highly effective against a wide range of chemical and biological (CB) threats. Based on peroxygen compounds, the active ingredient of the new decon solution comes in a stable solid form that is activated simply by adding water. The final solution has a moderate pH and breaks down into environmentally friendly compounds, so it is much easier on equipment, users, and the environment than competing products.
The current US military decontamination solutions, DF200 and HTH, are effective. However, HTH is highly corrosive to equipment, DF200 requires long contact times (up to 30 minutes), and both contain components that are harsh on equipment, users, and the environment. The Navy’s new peroxygen-based decon minimizes those issues while still maintaining high efficacy against a wide panel of chemical and biological threats.
- Friendly for equipment, users, and the environment: The Navy’s new decontamination solution has a moderate pH and generates virtually no toxic-byproducts.
- Easy to use: The active ingredient ships as an easy-to-handle solid and stores wells. Activation is fast—just add water. The active solution’s peracid oxidizers tackle an array of targets in minutes without solvents and without sacrificing useable life once mixed.
- Extensively tested: This new breed of decon solution has been undergoing Navy testing since 1999. A large body of data, including live agent testing results, is available to support additional development efforts and registration filings.
- Commercial applications: The formulation has a variety of potential applications as a commercial antimicrobial or pesticide.
US patent 7,064,241 is available for license. Additional details of the technology, an overview of the licensing process, and an interview with the inventors, are available through TechLink.